Optics: measuring and testing – By polarized light examination – With birefringent element
Patent
1994-06-01
1996-10-08
Turner, Samuel A.
Optics: measuring and testing
By polarized light examination
With birefringent element
356358, 356400, G01B 902
Patent
active
055637086
ABSTRACT:
In a step-and-repeat type semiconductor device manufacturing exposure apparatus, a pattern of a reticle can be transferred to a wafer with no chip rotation or no array error. For this sake, the direction of rotation of an X axis or a Y axis of the reticle about a Z axis is detected, and an X-Y-.theta. stage is rotationally moved about the Z axis in accordance with the detected value and by using a measurement output of a laser interferometer. Also, after rotational movement of the X-Y-.theta. stage about the Z axis, the X-Y-.theta. stage is moved while using a measurement output of the laser interferometer, to print the pattern of the reticle onto different zones of the wafer sequentially.
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Canon Kabushiki Kaisha
Turner Samuel A.
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