Semiconductor device, manufacturing method, and system

Details Semiconductor device, manufacturing method, and system Semiconductor device, manufacturing method, and system

1995-11-09

1999-11-02

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Multizone chamber

118723MW, 118723MR, 118723MP, 31511141, C23C 1600

Patent

active

059762594

ABSTRACT:
An improved semiconductor device manufacturing system and method is shown. In the system, undesirable sputtering effect can be averted by virtue of a combination of an ECR system and a CVD system. Prior to the deposition according to the above combination, a sub-layer can be pre-formed on a substrate in a reaction chamber and transported to another chamber in which deposition is made according to the combination without making contact with air, so that a junction thus formed has good characteristics.

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