Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2007-06-12
2008-10-07
Wilczewski, M. (Department: 2822)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S794000, C438S905000
Reexamination Certificate
active
07432215
ABSTRACT:
A semiconductor device manufacturing method comprises a first step of forming, by a thermal chemical vapor deposition method, a silicon nitride film on an object disposed in a reaction container, with bis tertiary butyl amino silane and NH3flowing into the reaction container, and a second step of removing silicon nitride formed in the reaction container, with NF3gas flowing into the reaction container.
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Maeda Kiyohiko
Mizuno Norikazu
Hogan & Hartson LLP
Kokusai Electric Co. Ltd.
Wilczewski M.
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