Semiconductor device including p-type silicon layer...

Active solid-state devices (e.g. – transistors – solid-state diode – With specified impurity concentration gradient – With high resistivity

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S613000, C257S616000, C257S655000, C257SE29336

Reexamination Certificate

active

10785073

ABSTRACT:
The invention provides a semiconductor device having a pn diode that includes a p-type SiGe layer and a n-type Si layer junctioned to the p-type SiGe layer. A built-in potential of the pn diode can be reduced, and thus obtaining a diode characteristics with lower impedance compared to the conventional scheme. Further, by forming a bridge-rectifier circuit with the pn diode or the like, alternating-current voltages can efficiently be converted into direct-current voltages. Accordingly, the invention provides a semiconductor device and method of manufacturing the same that can flow a larger electrical current in the forward direction of a diode by improving the voltage-current characteristics of the diode.

REFERENCES:
patent: 3710206 (1973-01-01), Matsushita
patent: 4126713 (1978-11-01), DiBugnara
patent: 4575925 (1986-03-01), Kanbara et al.
patent: 5610790 (1997-03-01), Staab et al.
patent: 6049109 (2000-04-01), Omura et al.
patent: 6055460 (2000-04-01), Shopbell
patent: 6111289 (2000-08-01), Udrea
patent: 6187684 (2001-02-01), Farber et al.
patent: 6417526 (2002-07-01), Brown et al.
patent: 6518197 (2003-02-01), Hirose
patent: 2003/0059985 (2003-03-01), Adkisson et al.
patent: 2003/0071291 (2003-04-01), Beamson
patent: 2003/0092213 (2003-05-01), Yamazaki et al.
patent: 2003/0102534 (2003-06-01), Huang
patent: 2003/0137284 (2003-07-01), DiPiazza
patent: 2003/0197598 (2003-10-01), Hayashi
patent: 2004/0135235 (2004-07-01), Poveda
patent: 05-175536 (1993-07-01), None
patent: A 06-267971 (1994-09-01), None
patent: A 08-088377 (1996-04-01), None
patent: A 9-153628 (1997-06-01), None
patent: A 10-12883 (1998-01-01), None
patent: A 10-163506 (1998-06-01), None
patent: A 2001-118856 (2001-04-01), None
patent: A 2001-237434 (2001-08-01), None
patent: A 2002-299641 (2002-10-01), None
Streetman, “Solid State Electronic Devices,” 1990, Prentice-Hall, Inc., third edition, p. 205.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device including p-type silicon layer... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device including p-type silicon layer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device including p-type silicon layer... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3934398

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.