Semiconductor device including memory cell and anti-fuse...

Semiconductor device manufacturing: process – Making device array and selectively interconnecting – Using structure alterable to conductive state

Reexamination Certificate

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C438S600000, C257SE21592

Reexamination Certificate

active

07601564

ABSTRACT:
A semiconductor device includes an anti-fuse portion and a memory cell portion each including a MOSFET structure having a gate insulating film formed on a semiconductor substrate and a gate electrode formed on the gate insulating film; wherein a depletion ratio in the gate electrode of the anti-fuse portion is different from the depletion ratio in the gate electrode of the memory cell portion, and the depletion ratio in the gate electrode of the anti-fuse portion is lower than the depletion ratio in the gate electrode of the memory cell portion.

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patent: 6452248 (2002-09-01), Le
patent: 6753590 (2004-06-01), Fifield et al.
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patent: 2002/0117724 (2002-08-01), Ariyoshi et al.
patent: 2001-308283 (2001-11-01), None
patent: 2002-134620 (2002-05-01), None
patent: 2003-86768 (2003-03-01), None
patent: 2003-115537 (2003-04-01), None
Yasuhiro Fukaura, et al., “A Highly Manufacturable High Density embedded SRAM Technology for 90nm CMOS”, IEDM 2002, pp. 415-418.

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