Semiconductor device including a diffusion layer

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Wire contact – lead – or bond

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S673000, C257S693000, C257S737000, C257S738000, C257S773000, C257S775000, C257S780000

Reexamination Certificate

active

06954001

ABSTRACT:
The semiconductor device includes a semiconductor element having an electrode formed on a surface thereof, and a metal wiring formed on the surface of the semiconductor element and electrically connected to the electrode. The metal wiring has an external electrode portion functioning as an external electrode. A thickness of the external electrode portion is greater than that of a non-electrode portion of the metal wiring, i.e., a portion of the metal wiring other than the external electrode portion.

REFERENCES:
patent: 5604379 (1997-02-01), Mori
patent: 5821627 (1998-10-01), Mori et al.
patent: 5892273 (1999-04-01), Iwasaki et al.
patent: 6207473 (2001-03-01), Hirai et al.
patent: 6396157 (2002-05-01), Nakanishi et al.
patent: 6414390 (2002-07-01), Nozawa
patent: 6475896 (2002-11-01), Hashimoto
patent: 6512298 (2003-01-01), Sahara et al.
patent: 6587353 (2003-07-01), Sumikawa et al.
patent: 6614113 (2003-09-01), Watanabe et al.
patent: 6662442 (2003-12-01), Matsui et al.
patent: 2002/0060904 (2002-05-01), Higuchi
patent: 2002/0079575 (2002-06-01), Hozoji et al.
patent: 2002/0108781 (2002-08-01), Mune et al.
patent: 1234908 (1999-11-01), None
patent: 9-129772 (1997-05-01), None
patent: 10079362 (1998-03-01), None
patent: 2000-188305 (2000-07-01), None
patent: 2000-299405 (2000-10-01), None
patent: 3137322 (2000-12-01), None
patent: 2001-118956 (2001-04-01), None
patent: 2001-135742 (2001-05-01), None
patent: 2001-291721 (2001-10-01), None
patent: 2001-291733 (2001-10-01), None
US 5,719,439, 2/1998, Iwasaki et al. (withdrawn)

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device including a diffusion layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device including a diffusion layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device including a diffusion layer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3457677

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.