Semiconductor device having a registration mark for use in an ex

Stock material or miscellaneous articles – Structurally defined web or sheet – Including variation in thickness

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33180R, 33286, 356401, 430 22, 156662, B32B 300, G01B 1100

Patent

active

043562230

ABSTRACT:
A registration mark to be used for a micro-fine working technique such as LSI's includes a smaller protrusion pattern within a larger recess pattern formed in a surface of the semiconductor substrate. The recess and protrusion patterns are used for coarse and fine positioning, respectively. The protrusion pattern implements precise positioning because it is isolated from other regions.

REFERENCES:
patent: 3461566 (1969-08-01), Gerstner
patent: 3783520 (1974-01-01), King
patent: 3969489 (1976-06-01), Cho
patent: 3990798 (1976-11-01), White
patent: 4015034 (1977-03-01), Smolen
patent: 4202627 (1980-05-01), Suzki et al.
patent: 4309813 (1982-01-01), Hull

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