Semiconductor device having a polysilicon layer with a...

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Schottky barrier to polycrystalline semiconductor material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S219000, C257S256000, C257S269000, C257S475000, C257S655000

Reexamination Certificate

active

08063406

ABSTRACT:
Various illustrative embodiments of methods for manufacturing a semiconductor device are described. These methods may include, for example, forming a first polysilicon layer above a substrate, wherein the first polysilicon layer comprises a doped portion, and forming a second polysilicon layer over a surface of the first polysilicon layer. Also, various illustrative embodiments of semiconductor devices are described that may be manufactured such as by the various methods described herein.

REFERENCES:
patent: 5378908 (1995-01-01), Chin et al.
patent: 6750487 (2004-06-01), Fried et al.
patent: 6833588 (2004-12-01), Yu et al.
patent: 6930362 (2005-08-01), Mirabedini et al.
patent: 6995065 (2006-02-01), Chou et al.
patent: 7026688 (2006-04-01), Kim et al.
patent: 7045422 (2006-05-01), Enders et al.
patent: 7056814 (2006-06-01), Kim
patent: 2002/0179953 (2002-12-01), Yoshida
patent: 2004/0209411 (2004-10-01), Fisher et al.
patent: 2007/0249077 (2007-10-01), Sze et al.
patent: 2009/0134454 (2009-05-01), Takeuchi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device having a polysilicon layer with a... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device having a polysilicon layer with a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having a polysilicon layer with a... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4287937

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.