Semiconductor device having a high breakdown voltage...

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – With means to increase breakdown voltage

Reexamination Certificate

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C257S168000, C257S409000, C257S487000, C257S491000, C257S787000

Reexamination Certificate

active

11204052

ABSTRACT:
An ion-through region100, 102is provided as a first opening in a passivation film90on a source electrode70and a drain electrode80. The passivation film90is coated with a sealing resin to package the semiconductor device. At this point, the ion-through region100, 102is filled with the sealing resin to put the sealing resin into direct contact with the source electrode70and the drain electrode80. With this structure, movable ions accumulated at an interface of the sealing resin with the passivation film90in a high temperature and high humidity atmosphere are discharged to the source electrode70and the drain electrode80via the ion-through region100, 102and thus do not influence an N−-type extended drain region30. Therefore, the drain breakdown voltage can be improved.

REFERENCES:
patent: 6333206 (2001-12-01), Ito et al.
patent: 2002/0056844 (2002-05-01), Yamazaki et al.
patent: 2002/0135019 (2002-09-01), Noda
patent: 2005/0062081 (2005-03-01), Takami
patent: 09-0252131 (1997-09-01), None
Fujishima et al.; A 700V Lateral Power MOSFET with Narrow Gap Double Metal Field Plates Realizing Low On-resistance and Long-term Stability of Performance;International Symposium on Power Semiconductor Devices&ICs; c. 2001.; pp. 255.
Hossain et al.; “Field-plate Effects on the Breakdown Voltage of an Integrated High-voltage LDMOS Transistor”;International Symposium on Power Semiconductor Devices&ICs; c. 2004; pp. 237.

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