Semiconductor device having a heterojunction and a two dimension

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

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257194, 257 26, H01L 29804, H01L 29784

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active

053810279

ABSTRACT:
This invention discloses a heterojunction type field effect transistor such as 2DEG-FET and a heterojunction type bipolar transistor such as 2DEG-HBT. The former is fabricated by applying to the formation of its source and drain regions a technique which causes the disorder of the heterojunction by intoduction of an impurity such as by ion implantation or a technique which causes the disorder of the heterojunction by forming a film made of at least one kind of material selected from insulators, metals and semiconductors which have a different linear coefficient of thermal expansion from that of the material of a semiconductor substrate on the heterojunction semiconductor region which is to be disordered. The latter is fabricated by applying either of the techniques described above to a base ohmic contact region. These semiconductor devices can reduce the source-gate resistance and the parasitic base resistance. The invention discloses also the structure of the ohmic contact layer which has a trench on the surface thereof and is particularly effective for reducing the source-gate parasitic resistance.

REFERENCES:
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patent: 4677457 (1987-06-01), Wolter
patent: 4695857 (1987-09-01), Baba et al.
patent: 4806994 (1989-02-01), Hayakawa et al.
patent: 4916498 (1990-04-01), Berenz
patent: 4937204 (1990-06-01), Ishibashi et al.
patent: 4987462 (1991-01-01), Kim et al.
patent: 5258631 (1993-11-01), Usagawa et al.

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