Semiconductor device having a hetero junction

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357 59, 357 63, 357 64, H01L 29161

Patent

active

040620344

ABSTRACT:
A semiconductor device comprising a silicon substrate with an oxygen doped polycrystalline or amorphous silicon layer formed on the substrate so as to form a hetero junction therewith. A transistor formed according to the invention has an emitter-base hetero junction and has a high current gain.

REFERENCES:
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patent: 3961997 (1976-06-01), Chu
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Brodsky et al., Phys. Stat. Sol. (b), 72, 761, 1975, pp. 761-770.
Busmundrud, Phys. Stat. Sol. (a) 28, 255 (1975).

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