Semiconductor device having a group III-V epitaxial semiconducto

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357 15, 357 16, 357 61, 357 63, H01L 2980

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051443791

ABSTRACT:
A semiconductor device comprises a substrate of a first material, a buffer layer of a second, group III-V semiconductor material provided on the substrate epitaxially, and a barrier layer of a third, group III-V compound semiconductor material different from the first and second materials and having a resistivity substantially larger than the resistivity of the buffer layer. The barrier layer further has a second lattice constant different from the lattice constant of the buffer layer and characterized by a band gap substantially larger than the band gap of the buffer layer. The barrier layer is provided on the buffer layer directly and an active layer of a fourth, group III-V compound semiconductor layer is provided on the barrier layer. On the active layer, an active device is provided such that the active device at least has a part formed in the active layer.

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patent: 4916498 (1990-04-01), Berenz
patent: 4987463 (1991-01-01), Goronkin et al.

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