Semiconductor device fabrication including a non-destructive met

Details Semiconductor device fabrication including a non-destructive met Semiconductor device fabrication including a non-destructive met

1987-01-28

1988-11-29

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430326, 430394, G03C 500

Patent

active

047881178

ABSTRACT:
A non-destructive double exposure method of examining photoresist features in section by, e.g., scanning electron microscopy, is described.

REFERENCES:
patent: 4591540 (1986-05-01), Bohlen et al.
Walker, "Reduction of Photoresist Standing-Wave Effects by Post-Exposure Bake," IEEE on Electron Devices, Jul. 1975.
Briggs et al., "Method of Artwork Generation", IBM Tech. Dis. Bull., vol. 21(5), Oct. 1978, pp. 1926-1927.

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