Semiconductor device employing group III-V nitride...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

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C257SE27014

Reexamination Certificate

active

08044434

ABSTRACT:
The semiconductor device includes a P-type group III-V nitride semiconductor layer, an N-type group III-V nitride semiconductor layer, and an electrode in contact with both of the P-type group III-V nitride semiconductor layer and the N-type group III-V nitride semiconductor layer. The electrode includes a first electrode portion made of a first conductive material, and a second electrode portion, made of a second conductive material different from the first conductive material, bonded to the first electrode portion. The first electrode portion is in contact with the P-type group III-V nitride semiconductor layer, and the second electrode portion is in contact with the N-type group III-V nitride semiconductor layer.

REFERENCES:
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patent: 7211839 (2007-05-01), Kachi et al.
patent: 7439555 (2008-10-01), Beach et al.
patent: 2001/0040246 (2001-11-01), Ishii
patent: 2005/0127394 (2005-06-01), Nagahama et al.
patent: 2008/0274621 (2008-11-01), Beach et al.
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patent: 2000-091253 (2000-03-01), None
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patent: 2004-260140 (2004-09-01), None
patent: 2005-175276 (2005-06-01), None
patent: 2005-203753 (2005-07-01), None
Baker, T.J. et al., Characterization of Planar Semipolar Gallium Nitride Films on Sapphire Substrates, Jpn J Appl Phys Part 2, 2006, vol. 45, No. 4-7, pp. L154-L157.
Satoshi Okubo, “Not Only Shining Any Longer GaN Behind Evolution of Devices”, Jun. 5, 2006, Nikkei Electronics, pp. 51-60, which is described on page 2 of English specification.

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