Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Patent
1997-03-19
1997-12-16
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
4302721, 4302751, 4302761, 430510, 430512, 430524, 430525, 430950, 257629, G03C 1825, G03F 709
Patent
active
056983522
ABSTRACT:
A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer. The method comprises (I) forming an equi-contour line for the amount of absorbed light regarding a photoresist of an optional film thickness using the optical condition of the anti-reflective layer as a parameter, (II) conducting the same procedure as in (I) above for a plurality of resist film thicknesses, (III) finding a common region for the amount of absorbed light with respect to each of the traces obtained, thereby determining the optical condition for the anti-reflective layer, (IV) applying same procedures as described above while changing the condition of the anti-reflective layer, thereby determining the optical condition for the anti-reflective layer, and (V) determining the optimum optical condition such as the kind and the thickness of the anti-reflective layer under a certain condition of the anti-reflective layer.
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Gocho Tetsuo
Ogawa Tohru
Sony Corporation
Young Christopher G.
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