Semiconductor device comprising an MOS capacitance

Semiconductor device manufacturing: process – Making passive device – Planar capacitor

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Details

438251, 438519, 438942, 257306, 257532, 257917, H01L 21265, H01L 27108, H01L 2900

Patent

active

059565934

ABSTRACT:
An improved semiconductor device including an MOS capacitance is provided, having enhanced MOS capacitance accuracy. A well of a first conductivity type is formed at the main surface of a semiconductor substrate. The above-described well is removed immediately under a capacitance dope layer.

REFERENCES:
patent: 4760034 (1988-07-01), Barden
patent: 4826779 (1989-05-01), Wright et al.
patent: 5416354 (1995-05-01), Blackstone
patent: 5548150 (1996-08-01), Omura et al.
patent: 5576570 (1996-11-01), Ohsawa et al.
patent: 5805410 (1998-09-01), Lee

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