Semiconductor device cleaning employing heterogeneous...

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S002000, C134S003000, C134S026000, C134S902000, C257SE21228

Reexamination Certificate

active

10685684

ABSTRACT:
The present invention provides a method for cleaning semiconductor devices through heterogeneous nucleation of cavitation bubbles. Heterogeneous nucleation is performed by applying sonic energy to a cleaning solution and a phase material in order to remove unwanted particles from semiconductor devices. A surfactant may be added to the phase material and the cleaning solution.

REFERENCES:
patent: 5681396 (1997-10-01), Madanshetty
patent: 5800626 (1998-09-01), Cohen et al.
patent: 6033996 (2000-03-01), Rath et al.
patent: 6167891 (2001-01-01), Kudelka et al.
patent: 6191085 (2001-02-01), Cooper et al.
patent: 6295998 (2001-10-01), Kudelka et al.
patent: 6418942 (2002-07-01), Gray et al.
patent: 6944097 (2005-09-01), Ferrell
patent: 2004/0187891 (2004-09-01), Chou et al.
“Cleaning Techniques for Wafer Surfaces”, Semiconductor international, Aug. 1987, pp. 81-85.
Damage Due to Spot Cavitation on Hemispherical Cylindrical Body (Comparison between Isolated Cavity and Parallel Cavities), Seiji Shimizu, Akihiro Ihara, Motoo Okada and Motoyasu Sakurai, Hiroshima Institute of Technology, CAV2001: Session A3.004, pp. 1-8, 2001. Retrieved from Internet <URL:cav2001.library.caltech.edu/archive/00000345/00/Spot—Cavitation—2001(full—paper—with figures). pdf>.
The Dynamics and Thermodynamics of Phase Transformations, Department of Mechanical and Materials Engineering Materials, Engineering 203/ Materials Chemistry 204 Laboratory Notes, Semester 1, 2002, pp. 1-2.
Similarities and Geometrical Effects on Rotating Cavitation in Two Scaled Centrifugal Pumps, Michael Hoffman, Bernd Stoffel, Jens Friedrichs, Gunter Kosyna, 2001, Retrieved from Internet <URL:cav2001.library.caltech.edu/archive/00000182/00/paper—68—001.pdf>.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device cleaning employing heterogeneous... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device cleaning employing heterogeneous..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device cleaning employing heterogeneous... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3769330

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.