Semiconductor device array mask inspection method and apparatus

Details Semiconductor device array mask inspection method and apparatus Semiconductor device array mask inspection method and apparatus

1980-12-19

1982-11-02

Anderson, Bruce C.

Radiant energy

Means to align or position an object relative to a source or...

2504922, H01J 3700

Patent

active

043575404

ABSTRACT:
This describes an automatic beam alignment and defect inspection system for masks. The system causes each field or sub-field to be individually aligned for inspection irrespective of the previous alignment of the mask or any other field or sub-field. This is accomplished by scanning a preselected portion of each field of sub-field, with a beam and adjusting the position of the deflection based on the reflected signal while scanning a pre-established portion of the selected field or sub-field. In this way a portion of each selected field or sub-field is used as an alignment mark and stepping errors avoided.
Once alignment is achieved a beam spot, comparable to the size of the minimum defect to be detected is scanned over the selected field or sub-field with an overlapping scan to find defects such as mask material in improper places or points where the mask material is missing.

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