Active solid-state devices (e.g. – transistors – solid-state diode – Voltage variable capacitance device – With specified dopant profile
Reexamination Certificate
2006-01-17
2006-01-17
Pham, Hoai (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Voltage variable capacitance device
With specified dopant profile
C257S506000
Reexamination Certificate
active
06987309
ABSTRACT:
A first conductivity type well area is formed in a semiconductor substrate. A second conductivity type semiconductor layer is formed at a first area of a well area which is separated by element isolation areas. In a base portion of the well area, a first conductivity type low resistance area is provided.
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Farahani Dana
Pham Hoai
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