Semiconductor device, annealing method, annealing apparatus...

Electric heating – Metal heating – By arc

Reexamination Certificate

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C219S121730

Reexamination Certificate

active

06870126

ABSTRACT:
The semiconductor device according to the present invention has a semiconductor layer having not smaller than two types of crystal grains different in size within a semiconductor circuit on a same substrate.

REFERENCES:
patent: 6210996 (2001-04-01), Yamazaki et al.
patent: 6252714 (2001-06-01), Guenther et al.
patent: 6524977 (2003-02-01), Yamazaki et al.
patent: 6632711 (2003-10-01), Sugano et al.
patent: 2002-151407 (2002-05-01), None
patent: 2002-280309 (2002-09-01), None
patent: 2002-313725 (2002-10-01), None
patent: 2002-313726 (2002-10-01), None
“Flat Panel Display”, 1999, Nikkei Micro Device, Supplemental Edition, Nikkei BP Co., Ltd., 1998, pp. 132-139, no translation.
M. Jyumonji, et al., “High-Resolution Beam Profiler—New Powerful Tool for Engineering Laterally-grown Grain Morphology -”, AMDp-17, (Late-News Paper), IDW '02, pp. 1387-1388.
Ryoichi Ishihara, et al., “Effects of Light Pulse Duration on Excimer-Laser Crystallization Characteristics of Silicon Thin Films”, Jpn. J. Appl. Phys. vol. 34, Part 1, No. 4A, Apr. 1995, pp. 1759-1764.
Masayuki Jyumonji, et al., “Double-Pulse Method for Enlarging Lateral Grain Growth of Excimer Laser Annealed Poly-Si Thin Films”, The Institute of Physical and Chemical Research, NEC Res. & Develop., vol. 42, No. 3, Jul. 2001, pp. 272-276.

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