Semiconductor device and method of manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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Details

257 30, 257321, 327420, H01L 2906, H01L 29788

Patent

active

060376058

ABSTRACT:
A semiconductor device includes spaced apart source and drain regions formed in a semiconductor substrate and a gate electrode insulatively spaced from a channel region between the source region and the drain region by a gate insulating film. Insulating layers are respectively formed between the source region and the channel region and between the drain region and the channel region.

REFERENCES:
patent: 5736765 (1998-04-01), Oh et al.
patent: 5834793 (1998-11-01), Shibata

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