Semiconductor device and method of manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With reflector – opaque mask – or optical element integral...

Reexamination Certificate

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Details

C257S059000, C257S070000, C257S072000, C257S079000, C257S350000, C257S627000, C438S149000

Reexamination Certificate

active

07023021

ABSTRACT:
The present invention improves the aperture ratio of a pixel of a reflection-type display device or a reflection type display device without increasing the number of masks and without using a blackmask. A pixel electrode (167) is arranged so as to partially overlap a source wiring (137) for shielding the gap between pixels from light, and a thin film transistor is arranged so as to partially overlap a gate wiring (166) for shielding a channel region of the thin film transistor from light, thereby realizing a high pixel aperture ratio.

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Japanese Patent Application Laid-Open No. 10-189252 (English Abstract attached).
Office Action in People's Republic of China Application No. 01117390.4 with English translation; Dec. 24, 2004.

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