Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Reexamination Certificate
2005-06-21
2005-06-21
Pert, Evan (Department: 2826)
Semiconductor device manufacturing: process
With measuring or testing
Optical characteristic sensed
C250S491100
Reexamination Certificate
active
06908776
ABSTRACT:
A method of manufacturing a semiconductor device comprising the steps of: preparing a flexible substrate which includes a base substrate having a light transmission property and an interconnecting pattern formed on one surface of the base substrate, the flexible substrate allowing a light to pass through a region other than the interconnecting pattern; recognizing a position of the interconnecting pattern by viewing the flexible substrate from a surface opposite to the surface on which the interconnecting pattern is formed through the base substrate; recognizing positions of electrodes formed on a semiconductor chip from a direction identical to that in recognizing the interconnecting pattern; and aligning the interconnecting pattern with the electrodes to connect the flexible substrate to the semiconductor chip by the face down bonding.
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patent: 6395124 (2002-05-01), Oxman et al.
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patent: 08-070013 (1996-03-01), None
patent: 10-123176 (1998-05-01), None
Ken Gilleo, Polymer Thick Film, 1996, Van Norstrand Reinhold, A division of International Thomson Publishing, Inc., pp. 363-373.
Pert Evan
Seiko Epson Corporation
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