Semiconductor device and method of manufacturing the same

Details Semiconductor device and method of manufacturing the same Semiconductor device and method of manufacturing the same

2005-10-11

2005-10-11

Nelms, David (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

Non-single crystal, or recrystallized, semiconductor...

Field effect device in non-single crystal, or...

C257S204000, C257S357000, C257S369000, C438S128000, C438S129000

Reexamination Certificate

active

06953950

ABSTRACT:
There is provided a semiconductor device which includes a first interlayer insulating film (first insulating film) formed over a silicon (semiconductor) substrate, a capacitor formed on the first interlayer insulating film and having a lower electrode, a dielectric film, and an upper electrode, a fourth interlayer insulating film (second insulating film) formed over the capacitor and the first interlayer insulating film, and a metal pattern formed on the fourth interlayer insulating film over the capacitor and its periphery to have a stress in an opposite direction to the fourth interlayer insulating film. As a result, characteristics of the capacitor covered with the interlayer insulating film can be improved.

REFERENCES:
patent: 6368909 (2002-04-01), Koo
patent: 6570203 (2003-05-01), Hikosaka et al.
patent: 2002/0047111 (2002-04-01), Judai
patent: 1061573 (2000-12-01), None
patent: 11-330390 (1999-11-01), None
patent: 2001-36025 (2001-02-01), None
patent: 2001-60669 (2001-03-01), None

Affiliated with

Also associated with

Rating

Semiconductor device and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3491907