Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1980-07-18
1982-09-28
Ives, P.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 85, 427 82, 427 86, 427 95, 428428, 428448, 428469, 148174, 148175, 148186, 148188, 357 49, 357 50, B05D 306, B05D 512, B32B 1706
Patent
active
043518567
ABSTRACT:
A semiconductor device is disclosed wherein a polycrystalline film whose principal constituent is silicon is formed on an amorphous or polycrystalline substrate, the polycrystalline film having a carrier mobility of at least 1 cm.sup.2 /V.multidot.sec, and wherein at least one active device is formed by employing the polycrystalline film as its material. A large-area or elongate active device can be provided. The polycrystalline film for such semiconductor device is formed by a method wherein the amorphous or polycrystalline substrate is mounted in a vacuum chamber and wherein the polycrystalline film whose principal constituent is silicon is evaporated on the substrate under the conditions that the pressure during the evaporation is below 1.times.10.sup.-8 Torr and that the partial pressure of oxygen during the evaporation is below 1.times.10.sup.-9 Torr.
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Katayama Yoshifumi
Maruyama Eiichi
Matsui Makoto
Shiraki Yasuhiro
Tsukada Toshihisa
Hitachi , Ltd.
Ives P.
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