Semiconductor device and method of manufacturing same

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

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Details

C257S774000, C438S672000, C438S675000

Reexamination Certificate

active

08072073

ABSTRACT:
A highly reliable semiconductor device in which connection reliability is assured at very small vias comprises: a semiconductor substrate; a first wiring structure placed on the semiconductor substrate and having one or more first wiring layers, one or more insulating layers and a first via; a second wiring structure placed on the first wiring structure and having one or more second wiring layers, one or more second insulating layers, a second via and a third via; and an external terminal provided on the second wiring structure. The second via, which is connected to the second wiring layer of the second wiring structure and to the external terminal, has a connection interface disposed at an end of the via that is on the side of the external terminal.

REFERENCES:
patent: 6313540 (2001-11-01), Kida et al.
patent: 6455943 (2002-09-01), Sheu et al.
patent: 6717272 (2004-04-01), Lee et al.
patent: 6955981 (2005-10-01), Lee et al.
patent: 7081679 (2006-07-01), Huang et al.
patent: 7301231 (2007-11-01), Antol et al.
patent: 7304385 (2007-12-01), Wang et al.
patent: 7629689 (2009-12-01), Maeda
patent: 2006/0226547 (2006-10-01), Wang et al.
patent: 2008/0272493 (2008-11-01), Ko et al.
patent: 1722429 (2006-01-01), None
patent: 6334334 (1994-12-01), None
patent: 964493 (1997-03-01), None
patent: 1051105 (1998-02-01), None
patent: 1174417 (1999-03-01), None
patent: 11204560 (1999-07-01), None
patent: 2002246500 (2002-08-01), None
Chinese Official Action—200810160807.6—Feb. 23, 2011.

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