Semiconductor device and method of farbricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating

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257640, 257637, H01L 2358

Patent

active

058118721

ABSTRACT:
A semiconductor device includes an interlevel film constituted by a first dielectrics film containing dangling bonds and a bonded group of Si and hydrogen, and a second dielectrics film formed on the first dielectrics film.

REFERENCES:
patent: 5455453 (1995-10-01), Harada et al.
patent: 5508540 (1996-04-01), Takeda et al.
patent: 5561319 (1996-10-01), Owens et al.

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