Semiconductor device and method of fabrication

Fishing – trapping – and vermin destroying

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437 41, 437 27, 437149, 437203, 437152, 357 234, H01L 21265, H01L 2122

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048106658

ABSTRACT:
A semiconductor device, such as a MOSFET or IGT, with a deep base region having a high dopant concentration at least as high as 5.times.10.sup.19 atoms per cubic centimeter and a method of fabrication are disclosed. The novel method involves formation of the deep base region at a later stage in the fabrication and reduces the leaching of dopant from the deep base region, as well as achieving greater control over the dopant concentration in the deep base region. Further, the increased dopant concentration in the deep base region lowers the base shunt resistance of the device to provide improved electrical ruggedness. For IGTs, parasitic thyristor action is reduced.

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