Semiconductor device and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S347000, C257S057000, C257S059000, C257S066000, C257S366000, C257S350000

Reexamination Certificate

active

10105625

ABSTRACT:
A semiconductor device, comprises a first electrode, a semiconductor film, a first insulating film and a second insulating film formed between the semiconductor film and the first electrode, a second electrode, and a third insulating film formed between the semiconductor film and the second electrode. The semiconductor film is formed on a flat surface of the second insulating film. A cross portion where the first electrode and the second electrode cross the semiconductor film at the same position is formed. The first electrode and the second electrode are connected to each other through an opening made in the first insulating film and the second insulating film outside the cross portion.

REFERENCES:
patent: 3823349 (1974-07-01), Dhaka et al.
patent: 4748485 (1988-05-01), Vasudev
patent: 4954855 (1990-09-01), Mimura et al.
patent: 5017983 (1991-05-01), Wu
patent: 5053354 (1991-10-01), Tanaka et al.
patent: 5075674 (1991-12-01), Katayama et al.
patent: 5079606 (1992-01-01), Yamamura et al.
patent: 5140391 (1992-08-01), Hayashi et al.
patent: 5188973 (1993-02-01), Omura et al.
patent: 5273921 (1993-12-01), Neudeck et al.
patent: 5323042 (1994-06-01), Matsumoto
patent: 5338959 (1994-08-01), Kim et al.
patent: 5339181 (1994-08-01), Kim et al.
patent: 5367180 (1994-11-01), Asai et al.
patent: 5371398 (1994-12-01), Nishihara
patent: 5396084 (1995-03-01), Matsumoto
patent: 5430320 (1995-07-01), Lee
patent: 5444282 (1995-08-01), Yamaguchi et al.
patent: 5461419 (1995-10-01), Yamada
patent: 5468987 (1995-11-01), Yamazaki et al.
patent: 5495119 (1996-02-01), Ikeuchi
patent: 5497019 (1996-03-01), Mayer et al.
patent: 5567959 (1996-10-01), Mineji
patent: 5616944 (1997-04-01), Mizutani et al.
patent: 5643826 (1997-07-01), Ohtani et al.
patent: 5644147 (1997-07-01), Yamazaki et al.
patent: 5672888 (1997-09-01), Nakamura
patent: 5801397 (1998-09-01), Cunningham
patent: 5808595 (1998-09-01), Kubota et al.
patent: 5818070 (1998-10-01), Yamazaki et al.
patent: 5835177 (1998-11-01), Dohjo et al.
patent: 5879969 (1999-03-01), Yamazaki et al.
patent: 5917225 (1999-06-01), Yamazaki et al.
patent: 5923962 (1999-07-01), Ohtani et al.
patent: 5923963 (1999-07-01), Yamanaka
patent: 6198133 (2001-03-01), Yamazaki et al.
patent: 6252248 (2001-06-01), Sano et al.
patent: 6326642 (2001-12-01), Yamazaki et al.
patent: 6327006 (2001-12-01), Sato et al.
patent: 6342717 (2002-01-01), Komatsu
patent: 6383904 (2002-05-01), Yu
patent: 6493046 (2002-12-01), Ueda
patent: 6504173 (2003-01-01), Hsu et al.
patent: 6583828 (2003-06-01), Wada et al.
patent: 6624450 (2003-09-01), Yamazaki et al.
patent: 6639246 (2003-10-01), Honda

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and method for manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and method for manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and method for manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3731567

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.