Semiconductor device and method for manufacturing same

Details Semiconductor device and method for manufacturing same Semiconductor device and method for manufacturing same

2007-12-18

2007-12-18

Enad, Elvin (Department: 2832)

Inductor devices

Coil or coil turn supports or spacers

Printed circuit-type coil

Reexamination Certificate

active

11267248

ABSTRACT:
The present invention provides an improved manufacturing stability of a semiconductor device provided with a spiral inductor. The semiconductor device100includes a silicon substrate101, an element isolating oxide film embedded within the silicon substrate101, a first insulating interlayer provided on the silicon substrate101, a spiral inductor120provided on the first insulating interlayer, and a shielding layer, which is provided between the spiral inductor120and the silicon substrate101, and elongates toward a direction along the surface of the substrate to provide a shield between the spiral inductor120and the silicon substrate101. Then, a plurality of substrate remaining regions131formed by the silicon substrate101partially remaining in the element isolating oxide film in a form of islands from the upper viewpoint are selectively provided right under the polysilicon105in the region for forming the spiral inductor120.

REFERENCES:
patent: 7034367 (2006-04-01), Kobori
patent: 2001-230375 (2001-08-01), None
patent: 2001230375 (2001-08-01), None
patent: 2002-110908 (2002-04-01), None

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