Semiconductor device and method for fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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C257S066000

Reexamination Certificate

active

07868329

ABSTRACT:
A semiconductor device, comprising a substrate, a semiconductive layer and a gate electrode is provided. The semiconductive layer having a crystallization promoting material is formed over the substrate. The semiconductive layer has a channel region, a first doped region and a second doped region. The first doped region has a donor and an acceptor, and the second doped region has a dopant which is selected from one of the donor and the acceptor. The second doped region is disposed between the first doped region and the channel region. The gate electrode is insulated from the channel region.

REFERENCES:
patent: 6396078 (2002-05-01), Uochi et al.
patent: 6727124 (2004-04-01), Nakajima et al.
patent: 6998641 (2006-02-01), Makita et al.
patent: 7148093 (2006-12-01), Makita
patent: 2002/0139979 (2002-10-01), Joo et al.
patent: 2005/0012096 (2005-01-01), Yamazaki et al.

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