Semiconductor device and manufacturing method thereof, and...

Details Semiconductor device and manufacturing method thereof, and... Semiconductor device and manufacturing method thereof, and...

2005-09-13

2005-09-13

Pham, Long (Department: 2814)

Active solid-state devices (e.g., transistors, solid-state diode

Alignment marks

Reexamination Certificate

active

06943458

ABSTRACT:
A semiconductor device with an enhanced registration accuracy photo-mask used for manufacturing the device and a registration accuracy enhancement method are provided, by detecting lens aberration which causes problems in the process of manufacturing a semiconductor device. The semiconductor device includes an auxiliary mark including an inner mark having stepped portions with four sides as stepped portions to be detected and an outer mark having stepped portion as stepped portions to be detected, provided approximately parallel to stepped portions along four sides of the inner mark.

REFERENCES:
patent: 5892291 (1999-04-01), Narimatsu et al.
patent: 5952134 (1999-09-01), Hwang
patent: 6083807 (2000-07-01), Hsu
patent: 6-176996 (1994-06-01), None
patent: 9-74063 (1997-03-01), None
patent: 11-28869 (1999-10-01), None
patent: 02000010254 (2000-01-01), None

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