Semiconductor device and manufacturing method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

Reexamination Certificate

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C257S059000, C257S258000, C257SE29202

Reexamination Certificate

active

07964875

ABSTRACT:
The semiconductor device includes a thin film transistor; a first interlayer insulating film over the thin film transistor; a first electrode electrically connected to one of a source region and a drain region, over the first interlayer insulating film; a second electrode electrically connected to the other of the source region and the drain region; a second interlayer insulating film formed over the first interlayer insulating film, the first electrode, and the second electrode; a first wiring electrically connected to one of the first electrode and the second electrode, on the second interlayer insulating film; and a second wiring not electrically connected to the other of the first electrode and the second electrode, on the second interlayer insulating film; in which the second wiring is not electrically connected to the other of the first electrode and the second electrode by a separation region formed in the second interlayer insulating film.

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patent: 7494066 (2009-02-01), Koyama et al.
patent: 7666722 (2010-02-01), Koyama
patent: 2005/0040531 (2005-02-01), Kurokawa
patent: 2005/0146006 (2005-07-01), Yamazaki et al.
patent: 2006/0049056 (2006-03-01), Wang et al.
patent: 3578057 (2004-10-01), None
patent: WO 2005/081307 (2005-09-01), None

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