Semiconductor device and manufacturing method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – For plural devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S686000, C257S777000, C257S778000, C257S779000, C257S780000, C257S784000

Reexamination Certificate

active

06960827

ABSTRACT:
A stacked-type semiconductor device has a reduced overall height and an improved reliability in the mechanical strength of the stacked structure. The semiconductor device also has an improved heat release characteristic. A first interposer has a surface on which first electrode pads are formed and a first semiconductor element is mounted with a circuit forming surface facing the first interposer. A second interposer has a surface on which second electrode pads are formed and a second semiconductor element is mounted with a circuit forming surface facing the second interposer. External connection terminals are provided on a surface of the second interposer opposite to the surface on which the second semiconductor element is mounted. The first and second interposers are electrically connected to each other by conductive members provided therebetween. A back surface of the first semiconductor element and a back surface of the second semiconductor element are fixed to each other by an adhesive.

REFERENCES:
patent: 5091209 (1992-02-01), Claverie et al.
patent: 5394608 (1995-03-01), Tottori et al.
patent: 5956233 (1999-09-01), Yew et al.
patent: 6025648 (2000-02-01), Takahashi et al.
patent: 6388333 (2002-05-01), Taniguchi et al.
patent: 6469374 (2002-10-01), Imoto
patent: 6528348 (2003-03-01), Ando et al.
patent: 2001-223297 (2001-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and manufacturing method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and manufacturing method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and manufacturing method thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3514992

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.