Semiconductor device and manufacturing method for the same

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S784000, C257S774000, C257S734000, C438S125000

Reexamination Certificate

active

11441067

ABSTRACT:
To provide a semiconductor device with high performance and reliability, in which peeling off an interconnection layer caused due to peeling off of a resin film at a land part is suppressed and thus electrical break down is prevented, and an efficient method for manufacturing the semiconductor device. The semiconductor device includes a semiconductor substrate (e.g., a silicon wafer10); an insulating film12formed on the semiconductor substrate10;a conductive layer20formed on the insulating film12,the conductive layer20formed of an interconnection part22and a land part24which connects the interconnection part22to an external terminal40;and a resin film30covering the conductive layer20,wherein the resin film30is in contact with the insulating film12at least at a part of the land part24by passing through the conductive layer20.

REFERENCES:
patent: 5215863 (1993-06-01), Nawata et al.
patent: 2003/0218246 (2003-11-01), Abe et al.
patent: 2004/0004293 (2004-01-01), Murayama
patent: 2002-280486 (2002-09-01), None
patent: 2004-22653 (2004-01-01), None
Chinese Office Action dated Jan. 4, 2008, issued in corresponding Chinese patent application No. 200610094071.8.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and manufacturing method for the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and manufacturing method for the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and manufacturing method for the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3958049

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.