Semiconductor device and manufacturing method for the same

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Bipolar transistor

Reexamination Certificate

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Details

C257S552000, C257S560000, C257S564000

Reexamination Certificate

active

07071500

ABSTRACT:
A bipolar semiconductor device including a collector layer covered at a portion of an outer periphery thereof with an insulating film and having a shape extending in an upper direction and a horizontal direction, with a gap being formed between the collector layer and the insulating film, and further including a base layer and an emitter layer disposed over the collector layer, and a manufacturing method of the semiconductor device. Since the collector layer has a shape extending in a portion thereof in the upward direction and the horizontal direction, an external collector region can be deleted, and both the parasitic capacitance and the collector capacitance in the intrinsic portion attributable to the collector can be decreased and, accordingly, a bipolar transistor capable of high speed operation at a reduced consumption power can be constituted.

REFERENCES:
patent: 5610435 (1997-03-01), Watanabe et al.
patent: 7-147287 (1993-11-01), None
patent: 11-233524 (1998-02-01), None
patent: 2000-77419 (1998-08-01), None

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