Semiconductor device and its manufacturing method

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Chip mounted on chip

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S783000, C257SE31110, C257SE31127, C438S064000, C438S065000, C438S107000

Reexamination Certificate

active

07656041

ABSTRACT:
A technique for mounting a plurality of electronic parts on one surface of a wiring substrate is provided. A semiconductor device comprises a wiring substrate having connection pads disposed outside a parts mount; a plurality of electronic parts with the first surface having a plurality of electrodes and the second surface fixing; a first underlying insulation layer provided between the connecting pads and the electrodes; a first metal layer formed overlaid on the first underlying insulation layer and providing connections between the connecting pads and the electrodes; a second underlying insulation layer having electrically insulating properties, provided between the respective electrodes of adjacent electronic parts; a second metal layer formed overlaid on the second underlying insulation layer and providing connections between the respective electrodes of adjacent electronic parts; and a first surface insulation layer covering the first metal layer and a second surface insulation layer covering the second metal layer.

REFERENCES:
patent: 2008/0067392 (2008-03-01), Miyaguchi
patent: 2008/0237766 (2008-10-01), Kim
patent: 2009/0117681 (2009-05-01), Maruyama et al.
patent: 2009/0126790 (2009-05-01), Nishi et al.
M. Ohishi, et al., “Si Penetration—A Structure Revolution Chip”, Nikkei Electronics, pp. 81-92 in Oct. 10, 2005 issue, published by Nikkei Business Publications, Inc.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and its manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and its manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and its manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4152907

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.