Semiconductor device and fabrication thereof

Static information storage and retrieval – Floating gate

Reexamination Certificate

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C365S185280, C365S185260, C365S185120, C257S317000, C257S318000, C257S315000, C257S319000

Reexamination Certificate

active

07554840

ABSTRACT:
A memory device is disclosed. A floating gate is disposed overlying a substrate. A tunneling dielectric layer is interposed between the floating gate and the substrate. An inter poly dielectric layer is disposed overlying the floating gate and the substrate. A word line is disposed overlying the floating gate, extending in a row direction. A bit line is disposed in the substrate, extending in a column direction, wherein the bit line is partially overlapped by the floating gate and the word line.

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A. Scheibe et al., Technology of a New n-Channel One-Transistor EAROM Cell Called SIMOS, May 1977, IEEE Transactions On Electron Devices, vol. ED-24, No. 5, pp. 1, 2, 4.

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