Alloys or metallic compositions – Aluminum base – Iron – cobalt – or nickel containing
Reexamination Certificate
2011-03-22
2011-03-22
Andújar, Leonardo (Department: 2826)
Alloys or metallic compositions
Aluminum base
Iron, cobalt, or nickel containing
C257S213000, C257S288000, C257SE51005, C257SE21006
Reexamination Certificate
active
07910053
ABSTRACT:
A semiconductor device includes a semiconductor layer, an Al alloy film electrically connected to the semiconductor layer, and a transparent electrode layer directly contacting with the Al alloy film at least over an insulating substrate. The Al alloy film includes one or more kinds of elements selected from Fe, Co and Ni in total of 0.5 to 10 mol %, and a remaining substantially comprises Al.
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Office Action issued Oct. 5, 2010, in JP Patent Application No. 2006-146724 with English Language Translation.
Inoue Kazunori
Ishiga Nobuaki
Kawase Kazumasa
Nagayama Kensuke
Andújar Leonardo
Harriston William
Mitsubishi Electric Corporation
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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