Semiconductor device and a method of manufacturing the same

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

Reexamination Certificate

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C349S043000, C349S149000, C349S150000, C349S151000

Reexamination Certificate

active

07995183

ABSTRACT:
A pixel TFT formed in a pixel region is formed on a first substrate by a channel etch type reverse stagger type TFT, and patterning of a source region and a drain region, and patterning of a pixel electrode are performed by the same photomask. A driver circuit formed by using TFTs having a crystalline semiconductor layer, and an input-output terminal dependent on the driver circuit, are taken as one unit. A plurality of units are formed on a third substrate, and afterward the third substrate is partitioned into individual units, and the obtained stick drivers are mounted on the first substrate.

REFERENCES:
patent: 4624737 (1986-11-01), Shimbo
patent: 4960719 (1990-10-01), Tanaka et al.
patent: 5028551 (1991-07-01), Dohjo et al.
patent: 5084961 (1992-02-01), Yoshikawa
patent: 5151806 (1992-09-01), Kawamoto et al.
patent: 5362660 (1994-11-01), Kwasnick et al.
patent: 5478766 (1995-12-01), Park et al.
patent: 5532180 (1996-07-01), Den Boer et al.
patent: 5539219 (1996-07-01), Den Boer et al.
patent: 5668379 (1997-09-01), Ono et al.
patent: 5706064 (1998-01-01), Fukunaga et al.
patent: 5710612 (1998-01-01), Mase
patent: 5739880 (1998-04-01), Suzuki et al.
patent: 5757453 (1998-05-01), Shin et al.
patent: 5757456 (1998-05-01), Yamazaki et al.
patent: 5766977 (1998-06-01), Yamazaki
patent: 5811318 (1998-09-01), Kweon
patent: 5821138 (1998-10-01), Yamazaki et al.
patent: 5825449 (1998-10-01), Shin
patent: 5834327 (1998-11-01), Yamazaki et al.
patent: 5847687 (1998-12-01), Hirakata et al.
patent: 5867233 (1999-02-01), Tanaka
patent: 5892562 (1999-04-01), Yamazaki et al.
patent: 5917567 (1999-06-01), Oh et al.
patent: 5959599 (1999-09-01), Hirakata
patent: 5966189 (1999-10-01), Matsuo
patent: 5977562 (1999-11-01), Hirakata et al.
patent: 5986724 (1999-11-01), Akiyama et al.
patent: 5990998 (1999-11-01), Park et al.
patent: 5995190 (1999-11-01), Nagae et al.
patent: 5998229 (1999-12-01), Lyu et al.
patent: 6008869 (1999-12-01), Oana et al.
patent: 6025892 (2000-02-01), Kawai et al.
patent: 6054975 (2000-04-01), Kurokawa et al.
patent: 6055028 (2000-04-01), Nishi et al.
patent: 6064456 (2000-05-01), Taniguchi et al.
patent: 6075257 (2000-06-01), Song
patent: 6097458 (2000-08-01), Tsuda et al.
patent: 6097459 (2000-08-01), Shimada et al.
patent: 6097465 (2000-08-01), Hiroki et al.
patent: 6114184 (2000-09-01), Matsumoto et al.
patent: 6118502 (2000-09-01), Yamazaki et al.
patent: 6124606 (2000-09-01), Den Boer et al.
patent: 6147667 (2000-11-01), Yamazaki et al.
patent: 6160600 (2000-12-01), Yamazaki et al.
patent: 6188452 (2001-02-01), Kim et al.
patent: 6190933 (2001-02-01), Shimabukuro et al.
patent: 6197625 (2001-03-01), Choi
patent: 6208390 (2001-03-01), Ejiri et al.
patent: 6208395 (2001-03-01), Kanoh et al.
patent: 6218221 (2001-04-01), Sah
patent: 6255668 (2001-07-01), Kang et al.
patent: 6265889 (2001-07-01), Tomita et al.
patent: 6266117 (2001-07-01), Yanagawa et al.
patent: 6271818 (2001-08-01), Yamazaki et al.
patent: 6278130 (2001-08-01), Joo et al.
patent: 6304243 (2001-10-01), Kondo et al.
patent: 6323051 (2001-11-01), Shimada
patent: 6335778 (2002-01-01), Kubota et al.
patent: 6344888 (2002-02-01), Yasukawa
patent: 6387737 (2002-05-01), Yamazaki et al.
patent: 6518557 (2003-02-01), Izumi et al.
patent: 6747288 (2004-06-01), Yamazaki et al.
patent: 6806495 (2004-10-01), Yamazaki et al.
patent: 6806499 (2004-10-01), Yamazaki et al.
patent: 6855957 (2005-02-01), Yamazaki et al.
patent: 6882012 (2005-04-01), Yamazaki et al.
patent: 6900084 (2005-05-01), Yamazaki
patent: 7102718 (2006-09-01), Yamazaki et al.
patent: 7256760 (2007-08-01), Yamazaki et al.
patent: 7579214 (2009-08-01), Yamazaki et al.
patent: 7612376 (2009-11-01), Yamazaki et al.
patent: 7714975 (2010-05-01), Yamazaki et al.
patent: 2002/0145602 (2002-10-01), Matsueda
patent: 2003/0058210 (2003-03-01), Yamazaki et al.
patent: 5-175500 (1993-07-01), None
patent: 05-323371 (1993-12-01), None
patent: 07-014880 (1995-01-01), None
patent: 8-87033 (1996-04-01), None
patent: 08-139333 (1996-05-01), None
patent: 08-250742 (1996-09-01), None
patent: 09-015621 (1997-01-01), None
patent: 09-054318 (1997-02-01), None
patent: 09-152626 (1997-06-01), None
patent: 10-048655 (1998-02-01), None
patent: 10-125928 (1998-05-01), None
patent: 10-133232 (1998-05-01), None
patent: 10-197897 (1998-07-01), None
patent: 11-160734 (1999-06-01), None
patent: 11-168214 (1999-06-01), None
patent: 11-202368 (1999-07-01), None
patent: 11-258596 (1999-09-01), None
patent: 96-262 (1996-01-01), None
patent: 510439 (2005-08-01), None
Japanese Office Action (Application No. 2000/069563) dated Nov. 4, 2009.
U.S. Appl. No. 09/566,733, filed May 9, 2000.
U.S. Appl. No. 10/144,067, filed May 14, 2002.
Wolf et al., “Chemical Vapor Deposition of Amorphous and Polycrystalline Thin Films”, pp. 161-175 and 335, 1986, Silicon Processing for the VLSI Era, vol. 1: Process Technology.
U.S. Appl. No. 09/566,730, filed May 9, 2000; Shunpei Yamazaki et al; “Semiconductor Device and Method of Fabricating the Same”.
U.S. Appl. No. 09/566,729, filed May 9, 2000; Shunpei Yamazaki et al.; “Liquid Crystal Display Device and Method of Manufacturing the Same”.
U.S. Appl. No. 09/566,742, filed Jul. 7, 2000; Shunpei Yamazaki et al.; “Liquid Crystal Display Device and Manufacturing Method Thereof”.
U.S. Appl. No. 09/566,722, filed May 9, 2000; Shunpei Yamazaki et al.; “Semiconductor Device and Manufacturing Method Thereof”.
U.S. Appl. No. 09/635,945; Setsuo et al.; filed Aug. 10, 2000; “Semiconductor Device and Method of Manufacturing the Semiconductor Device” (Specification, Claims and Drawings).
Wolf et al., “Chemical Vapor Deposition of Amorphous and Polycrystalline Thin Films”, pp. 161-175 and 335, 1986, Silicon Processing for the VLSI Era, vol. 1: Process Technology.
U.S. Appl. No. 09/635,945; Setsuo et al.; filed Aug. 10, 2000; “Semiconductor Device and Method of Manufacturing the Semiconductor Device” (Specification, Claims and Drawings).

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