Semiconductor device and a method for manufacturing the same

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148 627, 204 38A, 204192D, 427 88, 427 82, 427 90, 427 91, 4271264, H01L 21283, H01L 21314

Patent

active

044330049

ABSTRACT:
A semiconductor device is disclosed which includes a semiconductor substrate; a metal wiring layer comprising an Al alloy formed on the surface of this substrate; and an alumina layer covering this metal layer and containing at least one metal selected from the group consisting of Cu, Mg, Ni, Cr, Mn, Ti and Y. A method for manufacturing such a semiconductor device is also disclosed.

REFERENCES:
patent: 3716469 (1973-02-01), Bhatt
patent: 3725309 (1973-04-01), Ames
patent: 3759798 (1973-09-01), Graff
Howard et al., "Intermetallic Compounds of Al and Transition Metals: . . . ", Appl. Phys. 49(7), Jul. 1970, pp. 4083-4093.
Silvestri, "Formation of Al.sub.2 O.sub.3 From Porous Aluminum . . . ", IBM TDB, vol. 20, No. 9, Feb. 1978, pp. 3714-3716.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device and a method for manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and a method for manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and a method for manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1035649

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.