Semiconductor device alignment mark having oxidation...

Details Semiconductor device alignment mark having oxidation... Semiconductor device alignment mark having oxidation...

2005-05-10

2005-05-10

Flynn, Nathan J. (Department: 2826)

Active solid-state devices (e.g., transistors, solid-state diode

Alignment marks

C257S701000, C257S750000, C257S758000, C257S760000, C257S773000, C257S771000

Reexamination Certificate

active

06891277

ABSTRACT:
Alignment marks of a semiconductor device, formed prior to a step of applying heat treatment in an oxygen atmosphere, include an insulating film, a groove formed in the insulating film during a step of defining a contactor hole in a device part, a metal film formed at least on sidewalls of the groove during a step of burying the contactor hole in the device part, and a cover film formed on the insulating film to cover the metal film formed in the groove for prevention of oxidation of the metal film during heat treatment applied in an oxygen atmosphere.

REFERENCES:
patent: 5834349 (1998-11-01), Tseng
patent: 6288419 (2001-09-01), Prall et al.
patent: 6376325 (2002-04-01), Koo
patent: 6465872 (2002-10-01), Tada
patent: 6509593 (2003-01-01), Inoue et al.
patent: 6538272 (2003-03-01), Yamazaki et al.
patent: 6570203 (2003-05-01), Hikosaka et al.
patent: 6590252 (2003-07-01), Kutsunai et al.
patent: 6677682 (2004-01-01), Fujiki et al.
patent: 20020173139 (2002-11-01), Kweon
patent: 20030157780 (2003-08-01), Farrar et al.
patent: 20030207535 (2003-11-01), Kutsunai et al.
patent: 9-223656 (1997-08-01), None
patent: 2001-284204 (2001-10-01), None
patent: 2002-373974 (2002-12-01), None

Affiliated with

Also associated with

Rating

Semiconductor device alignment mark having oxidation... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device alignment mark having oxidation..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device alignment mark having oxidation... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3416406