Semiconductor device

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357 13, 357 15, 357 54, H01L 2714, H01L 3100, H01L 2948, H01L 2956

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active

040165892

ABSTRACT:
A semiconductor composite having a rectifying characteristic is provided by first forming an insulating film of a semiconductor compound such as SiO.sub.2 on a semiconductor substrate of N-type Si to a uniform thickness of 27A to 500A, for example, and then further depositing thereon a tin oxide film. The intermediate insulating film between the SnO.sub.2 film and the semiconductor substrate decreases the reverse leakage current, raises the reverse breakdown voltage and makes uniform the reverse breakdown voltage. The semiconductor composite of the present invention, as subjected to a predetermined value of light energy, shows an excellent switching characteristic with respect to a voltage applied to the composite in a reverse direction. Also the semiconductor composite of the present invention, as supplied with a certain value of reverse bias voltage or with no bias, shows an excellent switching characteristic with respect to light energy applied to the composite.

REFERENCES:
patent: 3106489 (1963-10-01), Lepsecter
patent: 3398021 (1968-08-01), Lehrer et al.
patent: 3497698 (1970-02-01), Phelan et al.
patent: 3679949 (1972-07-01), Vekusa et al.
patent: 3872490 (1975-03-01), Higashi et al.
Applied Physics Letters; Metal-Dependent Interface States in Thin MOS Structures, vol. 18, No. 9, May 1971, by Kar et al.
Applied Physics Letters; Tunneling Into Interface States of MOS Structures; by Dahlke, vol. 10, No. 10, May 1967.
Solid-State Electronics; Metal-Silicon Schottky Barriers by Turner, pp. 291-300, Mar. 1968.
C. Bulucea et al., "On The MOS Structure In The Avalanche Regime," Alta Frequenza, vol. 39, No. 8, Aug. 1970, pp. 734-740.
S. Kar et al., "Potentials And Direct Current in Si-(20 to 40A.degree.)SiO.sub.2 -Metal Structures," S.-S. Electronics, vol. 15, 1972, pp. 869-875.

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