Semiconductor device

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357 2, 357 10, 357 12, 357 88, H01L 2912

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active

046654283

ABSTRACT:
A semiconductor structure suitable for making a non-volatile memory comprises an electrically conducting substrate, at least two layers of different conductivity type selected from i, p and n-type amorphous or microcrystalline semiconducting material and an additional defect layer of amorphous or microcrystalline semiconductor material located between two of the said different layers. The defect layer reduces the voltage required to transform the structure to a memory device.

REFERENCES:
patent: 4471155 (1984-09-01), Mohr et al.
patent: 4476481 (1984-10-01), Iesaka et al.

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