Semiconductor device

Electrical transmission or interconnection systems – Nonlinear reactor systems – Parametrons

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357 234, 357 34, 357 38, 357 41, 357 47, 357 55, 307303, 307318, 307570, 307589, 307584, H01L 2702, H01L 2978, H01L 2906

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049410300

ABSTRACT:
A semiconductor device in which, in a planar type bipolar transistor having a collector layer (22) in a substrate side, a base layer (23) formed on the collector layer (22) and an emitter island (24) formed in the base layer (23), a groove (25) is provided in the emitter island (24) to reach at least the interface between the base layer (23) and the collector layer (22) to form a conductive film (27) through a dielectric film (26) in the groove to be employed as a gate electrode of a MOS-FET thereby to implement a monolithic parallel Bi-MOS device, while the base electrode (28) of the bipolar transistor (40) and the gate electrode (29) of the MOS-FET (50) are connected with a help of diodes including a zener diode (10) thereby to implement a monolithic three-terminal parallel Bi-MOS switching device of small chip size.

REFERENCES:
patent: 3285074 (1966-11-01), Elazar
patent: 3300710 (1967-01-01), Knauss
patent: 4331969 (1982-05-01), Baliga
patent: 4402003 (1983-08-01), Blanchard
patent: 4441117 (1984-04-01), Zommer
patent: 4546367 (1985-10-01), Schutten et al.
patent: 4568958 (1986-02-01), Baliga
patent: 4604535 (1986-08-01), Sasayama et al.
patent: 4620211 (1986-10-01), Baliga et al.
Advanced Technology, Session XVIII, ISSCC 77, Feb. 18, 1977, Internat'l Solid State Circuits Conf., vol. 20, No. 20.
Die Schaltungstechnik von Leistungs-MOSFETS, Electronik Arbeitsblatt Nr. 161, vol. 32, (1983).
"A Comparison Between BIMOS Device Types", M. S. Adler, IEEE Power Electronics Specialists Conference, Jun. 1982, pp. 371-377.

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