Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
Patent
1993-05-04
1994-09-06
Ngo, Ngan Van
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Charge transfer device
257 38, 257 39, 257222, 257224, 257232, 257233, 257242, 257243, 348249, 348311, H01L 2978, H01L 2714, H01L 3100
Patent
active
053450990
ABSTRACT:
In a CCD device, on a semiconductor substrate, and in the insulation films, plural first semiconductor regions and plural second semiconductor regions are formed buried in the insulation films, intermediating a tunneling insulation film therebetween in a manner to spatially isolate them from each other.
REFERENCES:
patent: 4878102 (1989-10-01), Bakker et al.
"Amorphous-silicon charge-coupled devices", Satoru Kishida et al, Applied Physics Letter, vol. 41 (No. 12), Dec. 15, 1982, pp. 1154-1156.
Carlo H. Sequin, et al: "Charge Transfer Device", published by Academic Press, Inc., in 1975; pp. 1-pp. 55.
Matsushita Electric - Industrial Co., Ltd.
Ngo Ngan Van
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