Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

Reexamination Certificate

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Details

C257S194000, C257S335000, C257S339000, C257S342000

Reexamination Certificate

active

07741655

ABSTRACT:
A semiconductor device includes a semiconductor substrate having a main surface and a semiconductor element having an insulated gate field effect portion formed in the semiconductor substrate. The semiconductor element includes an n−region, an n-type source region, a p-type base region, an n+region, and a gate electrode. The n−region and the n-type source region are formed in the main surface. The p-type base region is formed in the main surface adjacent to the n-type source region. The n+region is formed in the main surface adjacent to the p-type base region and opposed to the n-type source region with the p-type base region being interposed, and has an impurity concentration higher than the n−region. The n−region is formed in the main surface adjacent to the p-type base region and to the n+region.

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patent: 2004-260140 (2004-09-01), None

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