Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2009-08-03
2010-11-30
Menz, Douglas M (Department: 2891)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257S759000
Reexamination Certificate
active
07843066
ABSTRACT:
The present invention provides a semiconductor device capable of preventing occurrence of cracking and the like, taking a large area, where wiring and the like that function as elemental devices can be arranged, within a plurality of interlayer insulation films, and reducing production cost. The semiconductor device according to the present invention has a low dielectric constant film having a dielectric constant of not less than 2.7. In the low dielectric constant film and the like, materials (e.g., a first dummy pattern, a second dummy pattern) with a larger hardness than that of the low dielectric constant film are formed at a part under a pad part.
REFERENCES:
patent: 6908841 (2005-06-01), Burrell et al.
patent: 2004/0058520 (2004-03-01), Burrell et al.
patent: 2001-267323 (2001-09-01), None
Menz Douglas M
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Renesas Technologies Corporation
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