Static information storage and retrieval – Floating gate – Particular connection
Reexamination Certificate
2006-02-24
2008-07-29
Nguyen, Viet Q (Department: 2827)
Static information storage and retrieval
Floating gate
Particular connection
C365S185240, C365S185140, C365S185030, C365S185260
Reexamination Certificate
active
07405971
ABSTRACT:
A semiconductor integrated circuit includes non-volatile memory elements (PM1, PM2), each of which has a first source electrode, a first drain electrode, a floating gate electrode and a control gate electrode and is capable of having different threshold voltages, and read transistor elements (DM1, DM2), each of which has a second source electrode and a second drain electrode and is capable of having different mutual conductances according to the threshold voltage of the non-volatile memory element. The read transistor element has a switching state according to the electron injection state or the electron emission state, in other words, the writing state or the erasing state of the floating gate electrode. In a read operation, it is not necessary to cause a channel current to flow according to the threshold voltage of the non-volatile memory element.
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“A Single Poly EEPROM Cell Structure for use in Standard CMOS Processes” by Ohsaki, et al.pp. 1994 vol. 29.
Shukuri Shoji
Yanagisawa Kazumasa
Nguyen Viet Q
Renesas Technology Corp.
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