Static information storage and retrieval – Floating gate – Particular biasing
Reexamination Certificate
2005-03-01
2005-03-01
Le, Thong Q. (Department: 2818)
Static information storage and retrieval
Floating gate
Particular biasing
C365S189011
Reexamination Certificate
active
06862220
ABSTRACT:
A semiconductor device including a nonvolatile memory unit and a variable logic unit mounted on a chip is configured to achieve higher speed operation at a lower voltage. The semiconductor device includes a nonvolatile memory unit comprising a plurality of rewritable nonvolatile memory cells and a variable logic unit whose logical functions are determined, according to logic constitution definition data to be loaded into storage cells thereof. A nonvolatile memory cell essentially has a split gate structure composed of a selecting MOS transistor and a memory MOS transistor and constructed such that the dielectric withstand voltage of the gate of the selecting MOS transistor is lower than that of the memory MOS transistor or the gate insulation layer of the selecting MOS transistor is thinner than that of a high-voltage-tolerant MOS transistor. Because the selecting MOS transistor has a high Gm, a sufficiently great current for reading can be obtained.
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Sohrab Kianian, Amitay Levi, Dana Lee, and Yaw-Wen Hu, A Novel 3 Volts-Only, Small Sector Erase, High Density Flash E2PROM, 1994 Symposium of VLSI Technology Digest of Technical Papers (1994 IEEE), pp. 71-72.
Kawahara Takayuki
Kubo Masaharu
Matsuzaki Nozomu
Sawase Terumi
A. Marquez, Esq. Juan Carlos
Fisher Esq. Stanley P.
Le Thong Q.
Reed Smith LLP
Renesas Technology Corporation
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